Indian-American researcher wins top innovation award
Thursday, 04 November 2010, 18:10 IST
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Boston: Indian-American researcher Amit Goyal has been named the '2010 Innovator of the Year' by leading technology publication R&D Magazine, whose awards are touted as the 'Oscars of Innovation'. An IIT Kharagpur alumnus, Goyal is a researcher at the U.S. Department of Energy's Oak Ridge National Laboratory (ORNL) in Tennessee. Widely regarded as an international leader in the field of high-temperature superconducting (HTS) materials, Goyal is known for his contributions to the practical use of HTS materials and development and fabrication of wires that allow these superconductors to be adopted in the marketplace. Terming the award as a "tremendous honour", he said the recognition "represents an implicit responsibility of continuing to strive towards full commercialisation of the innovations I have been involved with." Goyal will receive his award at the 48th Annual R&D 100 Awards on November 11 in Florida. He has also developed flexible, single-crystal-like, semiconductor substrates for electronic device applications such as solar cells, which have led to the formation of the start-up TexMat. His technical contributions have been in the field of large-area, low-cost, high performance flexible electronic devices, including superconductor-based and semiconductor-based devices.
Source: PTI
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